http://scholars.ntou.edu.tw/handle/123456789/20199
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Liang, Yuan-Chang | en_US |
dc.contributor.author | Li, Tsun-Hsuan | en_US |
dc.date.accessioned | 2022-02-10T02:50:46Z | - |
dc.date.available | 2022-02-10T02:50:46Z | - |
dc.date.issued | 2022-01-01 | - |
dc.identifier.issn | 2191-9089 | - |
dc.identifier.uri | http://scholars.ntou.edu.tw/handle/123456789/20199 | - |
dc.description.abstract | Bi2S3 nanostructures with various morphologies were synthesized through hydrothermal vulcanization at different sulfur precursor (thiourea) concentrations. A 100 nm thick sputter-deposited Bi2O3 thin-film layer on a fluorine-doped tin oxide glass substrate was used as a sacrificial template layer. The etching of the Bi2O3 sacrificial template layer and the regrowth of Bi2S3 crystallites during hydrothermal vulcanization produced the different Bi2S3 nanostructure morphologies. The lowest sulfur precursor concentration (0.01 M) induced the formation of Bi2S3 nanosheets, whereas the Bi2S3 nanoribbons and nanowires were formed with increased sulfur precursor concentrations of 0.03 and 0.1 M, respectively. These results indicate that sputter-deposited Bi2O3 thin-film layers can be effectively used to form low-dimensional Bi2S3 crystals with controllable morphologies. Among the various Bi2S3 samples, the Bi2S3 nanosheets exhibited superior photoactive ability. The higher active surface area, surface defect density, light absorption capacity, and photo-induced charge separation ability of Bi2S3 nanosheets explain their superior photoelectrocatalytic degradation ability of rhodamine B dyes. | en_US |
dc.language.iso | English | en_US |
dc.publisher | WALTER DE GRUYTER GMBH | en_US |
dc.relation.ispartof | NANOTECHNOLOGY REVIEWS | en_US |
dc.subject | hydrothermal vulcanization | en_US |
dc.subject | sulfide nanostructure | en_US |
dc.subject | photoelectrocatalyst | en_US |
dc.title | Controllable morphology of Bi2S3 nanostructures formed via hydrothermal vulcanization of Bi2O3 thin-film layer and their photoelectrocatalytic performances | en_US |
dc.type | journal article | en_US |
dc.identifier.doi | 10.1515/ntrev-2022-0016 | - |
dc.identifier.isi | WOS:000735009200001 | - |
dc.relation.journalvolume | 11 | en_US |
dc.relation.journalissue | 1 | en_US |
dc.relation.pages | 284-297 | en_US |
item.cerifentitytype | Publications | - |
item.openairetype | journal article | - |
item.openairecristype | http://purl.org/coar/resource_type/c_6501 | - |
item.fulltext | no fulltext | - |
item.grantfulltext | none | - |
item.languageiso639-1 | English | - |
crisitem.author.dept | College of Electrical Engineering and Computer Science | - |
crisitem.author.dept | Department of Optoelectronics and Materials Technology | - |
crisitem.author.dept | National Taiwan Ocean University,NTOU | - |
crisitem.author.parentorg | National Taiwan Ocean University,NTOU | - |
crisitem.author.parentorg | College of Electrical Engineering and Computer Science | - |
顯示於: | 光電與材料科技學系 |
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