http://scholars.ntou.edu.tw/handle/123456789/25322
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Lee, Pee-Yew | en_US |
dc.contributor.author | Li, Chen-Yu | en_US |
dc.contributor.author | Bai, Yi-Hong | en_US |
dc.contributor.author | Huang, Hung Ji | en_US |
dc.contributor.author | Weng, Chun-Jen | en_US |
dc.contributor.author | Lin, Yung-Sheng | en_US |
dc.date.accessioned | 2024-11-01T06:27:48Z | - |
dc.date.available | 2024-11-01T06:27:48Z | - |
dc.date.issued | 2024/6/1 | - |
dc.identifier.issn | 1087-1357 | - |
dc.identifier.uri | http://scholars.ntou.edu.tw/handle/123456789/25322 | - |
dc.description.abstract | In fluoride-assisted galvanic replacement reaction (FAGRR), metallic dendrites are formed simultaneously with hydrogen gas. However, the presence of hydrogen bubbles impedes the reduction of metallic ions to form metallic dendrites. This study investigates the FAGRR approach to manufacturing Ag dendrites where ethanol is incorporated into an AgNO3 reaction solution. The findings of this study demonstrate the efficacy of ethanol as an antifoaming agent in enhancing the deposition of the Ag dendrites during the FAGRR process. The antifoaming effect of ethanol becomes more intense at higher concentrations of AgNO3. The introduction of ethanol into FAGRR can significantly improve processing efficiency and yield in the limited time for manufacturing science and engineering. | en_US |
dc.language.iso | English | en_US |
dc.publisher | ASME | en_US |
dc.relation.ispartof | JOURNAL OF MANUFACTURING SCIENCE AND ENGINEERING-TRANSACTIONS OF THE ASME | en_US |
dc.subject | hydrogen bubble | en_US |
dc.subject | sliver | en_US |
dc.subject | dendrite | en_US |
dc.subject | antifoaming | en_US |
dc.subject | ethanol | en_US |
dc.subject | fluoride-assisted galvanic replacement reaction | en_US |
dc.subject | advanced materials and processing | en_US |
dc.subject | micro- and nano-machining and processing | en_US |
dc.title | Effects of Antifoaming Agents on Manufacturing Silver Dendrites Through Fluoride-Assisted Galvanic Replacement Reaction | en_US |
dc.type | journal article | en_US |
dc.identifier.doi | 10.1115/1.4065277 | - |
dc.identifier.isi | WOS:001225916300003 | - |
dc.relation.journalvolume | 146 | en_US |
dc.relation.journalissue | 6 | en_US |
dc.identifier.eissn | 1528-8935 | - |
item.cerifentitytype | Publications | - |
item.openairetype | journal article | - |
item.openairecristype | http://purl.org/coar/resource_type/c_6501 | - |
item.fulltext | no fulltext | - |
item.grantfulltext | none | - |
item.languageiso639-1 | English | - |
crisitem.author.dept | College of Electrical Engineering and Computer Science | - |
crisitem.author.dept | Department of Optoelectronics and Materials Technology | - |
crisitem.author.dept | National Taiwan Ocean University,NTOU | - |
crisitem.author.parentorg | National Taiwan Ocean University,NTOU | - |
crisitem.author.parentorg | College of Electrical Engineering and Computer Science | - |
Appears in Collections: | 光電與材料科技學系 |
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