http://scholars.ntou.edu.tw/handle/123456789/4435
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Hsieh, H. H. | en_US |
dc.contributor.author | Wu Kai | en_US |
dc.contributor.author | Jang, W. L. | en_US |
dc.contributor.author | Lee, P. Y. | en_US |
dc.contributor.author | Wang, W. H. | en_US |
dc.contributor.author | Rong-Tan Huang | en_US |
dc.date.accessioned | 2020-11-19T00:37:45Z | - |
dc.date.available | 2020-11-19T00:37:45Z | - |
dc.date.issued | 2007-03 | - |
dc.identifier.issn | 0030-770X | - |
dc.identifier.uri | http://scholars.ntou.edu.tw/handle/123456789/4435 | - |
dc.description.abstract | The oxidation behavior of two Cu-base bulk metallic glasses (BMGs), having compositions Cu–30Zr–10Ti and Cu–20Zr–10Ti–10Hf (in at.%), was studied over the temperature range of 350–500 °C in dry air. In general, the oxidation kinetics of both BMGs followed the parabolic rate law, with the oxidation rates increasing with increasing temperature. The addition of Hf slightly reduced the oxidation rates at 350–400 °C, while the opposite results observed at higher temperatures. It was found that the oxidation rates of both BMGs were significantly higher than those of polycrystalline pure-Cu. The scales formed on both BMG alloys were strongly composition dependent, consisting of mostly CuO/Cu2O and minor amounts of cubic-ZrO2 and ZrTiO4 for the ternary BMG, and of CuO, cubic-ZrO2, and Zr5Ti7O24 for the quaternary BMG. The formation of ternary oxides (ZrTiO4 and Zr5Ti7O24) was inferred to be responsible for the fast oxidation rates of the BMGs. | en_US |
dc.language.iso | en_US | en_US |
dc.publisher | Springer Nature | en_US |
dc.relation.ispartof | Oxidation of Metals | en_US |
dc.subject | Bulk metallic alloys | en_US |
dc.subject | CuO | en_US |
dc.subject | Cu2O | en_US |
dc.subject | ZrO2 | en_US |
dc.subject | ZrTiO4 | en_US |
dc.subject | Zr5Ti7O24 | en_US |
dc.title | The oxidation behavior of Cu–Zr–Ti–base bulk metallic glasses in air at 350–500 °C | en_US |
dc.type | journal article | en_US |
dc.identifier.doi | <Go to ISI>://WOS:000244890000003 | - |
dc.identifier.doi | <Go to ISI>://WOS:000244890000003 | - |
dc.identifier.doi | <Go to ISI>://WOS:000244890000003 | - |
dc.identifier.doi | 10.1007/s11085-007-9049-y | - |
dc.identifier.doi | <Go to ISI>://WOS:000244890000003 | - |
dc.identifier.doi | <Go to ISI>://WOS:000244890000003 | - |
dc.identifier.doi | <Go to ISI>://WOS:000244890000003 | - |
dc.identifier.url | <Go to ISI>://WOS:000244890000003 | - |
dc.relation.journalvolume | 67 | en_US |
dc.relation.journalissue | 3-4 | en_US |
dc.relation.pages | 179–192 | en_US |
item.cerifentitytype | Publications | - |
item.openairetype | journal article | - |
item.openairecristype | http://purl.org/coar/resource_type/c_6501 | - |
item.fulltext | no fulltext | - |
item.grantfulltext | none | - |
item.languageiso639-1 | en_US | - |
crisitem.author.dept | College of Electrical Engineering and Computer Science | - |
crisitem.author.dept | Department of Optoelectronics and Materials Technology | - |
crisitem.author.dept | National Taiwan Ocean University,NTOU | - |
crisitem.author.dept | College of Electrical Engineering and Computer Science | - |
crisitem.author.dept | Department of Optoelectronics and Materials Technology | - |
crisitem.author.dept | National Taiwan Ocean University,NTOU | - |
crisitem.author.orcid | https://orcid.org/0000-0001-8791-7775 | - |
crisitem.author.parentorg | National Taiwan Ocean University,NTOU | - |
crisitem.author.parentorg | College of Electrical Engineering and Computer Science | - |
crisitem.author.parentorg | National Taiwan Ocean University,NTOU | - |
crisitem.author.parentorg | College of Electrical Engineering and Computer Science | - |
Appears in Collections: | 光電與材料科技學系 |
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