http://scholars.ntou.edu.tw/handle/123456789/4445
標題: | Air-oxidation of a Cu50Zr50 binary amorphous ribbon at 350–425 °C | 作者: | Wu Kai Chen, W. S. Wu, Y. H. Lin, P. C. Chuang, C. P. Liaw, P. K. |
關鍵字: | Oxidation;Cu50Zr50 bulk amorphous ribbon;CuO;m-ZrO2;t-ZrO2 | 公開日期: | 九月-2012 | 出版社: | Elsevier | 卷: | 536 | 起(迄)頁: | S103-S108 | 來源出版物: | Journal of Alloys and Compounds | 摘要: | The oxidation behavior of a binary Cu50Zr50 bulk amorphous ribbon (CZ2-AR) was studied over the temperature range of 350–425 °C in dry air. The oxidation kinetics of the CZ2-AR generally followed a parabolic-rate law, indicating that diffusion is the rate-controlling step during oxidation. The oxidation rates of the CZ2-AR were strongly temperature-dependent, with its scaling-rate constants (ks values) increasing with temperature. Duplex scales formed on the CZ2-AR alloy were composed of an outer-layer of exclusive CuO and of a heterophasic inner-layer of CuO, monoclinic-ZrO2 (m-ZrO2) and tetragonal-ZrO2 (t-ZrO2). In addition, the CZ2-AR substrate started to form the crystalline Cu10Zr7 phase beneath the scales during the oxidation at T ≥ 375 °C, indicative of the occurrence of the crystallization of the amorphous substrate. |
URI: | http://scholars.ntou.edu.tw/handle/123456789/4445 | ISSN: | 0925-8388 | DOI: | 10.1016/j.jallcom.2011.12.175 |
顯示於: | 光電與材料科技學系 |
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