http://scholars.ntou.edu.tw/handle/123456789/4446
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Wu Kai | en_US |
dc.contributor.author | Y.R. Chen | en_US |
dc.contributor.author | T.H. Ho | en_US |
dc.contributor.author | H.H. Hsieh | en_US |
dc.contributor.author | D.C.Qiao | en_US |
dc.contributor.author | F.Jiang | en_US |
dc.contributor.author | G.Fan | en_US |
dc.contributor.author | P.K.Liaw | en_US |
dc.date.accessioned | 2020-11-19T00:37:46Z | - |
dc.date.available | 2020-11-19T00:37:46Z | - |
dc.date.issued | 2009-08 | - |
dc.identifier.issn | 0925-8388 | - |
dc.identifier.uri | http://scholars.ntou.edu.tw/handle/123456789/4446 | - |
dc.description.abstract | The oxidation behavior of the Zr58Cu22Al12Fe8 bulk metallic glasses (ZC4-BMG) was studied over the temperature range of 350–550 °C in dry air. The oxidation kinetics of the ZC4-BMG generally follow a multi-stage parabolic-rate law, and the steady-state parabolic-rate constants (kp values) increased with increasing the temperature when it is below the glass transition temperature (Tg = 413.3 °C). Conversely, the kp values were nearly identical from 400 to 550 °C. The scales formed on ZC4-BMG were composed mostly of tetragonal-ZrO2 (t-ZrO2) and minor amounts of Al2O3 and monoclinic-ZrO2 (m-ZrO2). The amounts of both Al2O3 and m-ZrO2 increased with increasing the temperature. In addition, the amorphous substrate remained unchanged after the oxidation for 36 h at T ≤ 375 °C. However, it transformed into different crystalline phases at higher temperatures, which are strongly dependent on the temperature and duration of time. | en_US |
dc.language.iso | en_US | en_US |
dc.publisher | Elsevier | en_US |
dc.relation.ispartof | Journal of Alloys and Compounds | en_US |
dc.subject | Bulk metallic glasses | en_US |
dc.subject | Oxidation | en_US |
dc.subject | X-ray diffraction | en_US |
dc.subject | Thermal analysis | en_US |
dc.subject | Microscopy | en_US |
dc.title | Air oxidation of a Zr58Cu22Al12Fe8 bulk metallic glass at 350–550 °C | en_US |
dc.type | journal article | en_US |
dc.identifier.doi | <Go to ISI>://WOS:000270619600125 | - |
dc.identifier.doi | <Go to ISI>://WOS:000270619600125 | - |
dc.identifier.doi | 10.1016/j.jallcom.2008.10.133 | - |
dc.identifier.doi | <Go to ISI>://WOS:000270619600125 | - |
dc.identifier.doi | <Go to ISI>://WOS:000270619600125 | - |
dc.identifier.doi | <Go to ISI>://WOS:000270619600125 | - |
dc.identifier.url | <Go to ISI>://WOS:000270619600125 | |
dc.relation.journalvolume | 483 | en_US |
dc.relation.journalissue | 1-2 | en_US |
dc.relation.pages | 519-525 | en_US |
item.cerifentitytype | Publications | - |
item.openairetype | journal article | - |
item.openairecristype | http://purl.org/coar/resource_type/c_6501 | - |
item.fulltext | no fulltext | - |
item.grantfulltext | none | - |
item.languageiso639-1 | en_US | - |
crisitem.author.dept | College of Electrical Engineering and Computer Science | - |
crisitem.author.dept | Department of Optoelectronics and Materials Technology | - |
crisitem.author.dept | National Taiwan Ocean University,NTOU | - |
crisitem.author.orcid | https://orcid.org/0000-0001-8791-7775 | - |
crisitem.author.parentorg | National Taiwan Ocean University,NTOU | - |
crisitem.author.parentorg | College of Electrical Engineering and Computer Science | - |
Appears in Collections: | 光電與材料科技學系 |
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