http://scholars.ntou.edu.tw/handle/123456789/4452
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Wu Kai | en_US |
dc.contributor.author | Cheng, F. P. | en_US |
dc.contributor.author | Lin, Y. R. | en_US |
dc.contributor.author | Chuang, C. W. | en_US |
dc.contributor.author | Huang, R. T. | en_US |
dc.contributor.author | Chen, D. | en_US |
dc.contributor.author | Kai, J. J. | en_US |
dc.contributor.author | Liu, C. T. | en_US |
dc.contributor.author | Wang, C. J. | en_US |
dc.date.accessioned | 2020-11-19T00:37:47Z | - |
dc.date.available | 2020-11-19T00:37:47Z | - |
dc.date.issued | 2020-09 | - |
dc.identifier.issn | 0925-8388 | - |
dc.identifier.uri | http://scholars.ntou.edu.tw/handle/123456789/4452 | - |
dc.description.abstract | The oxidation behavior of three Ni2FeCoCrAlx high-entropy alloys (where x = 0, 0.5, and 1.0) was studied at 600–900 °C in dry air. The oxidation kinetics of all the alloys obeyed the parabolic rate law at T ≥ 700 °C, with their oxidation rates steadily increasing with either increasing temperature or decreasing Al content. Discontinuous oxide particles grew on the alloys at 600 °C, while multiple layered scales and an exclusive Al2O3 layer formed on the Al-free and the Al-containing alloys, respectively at T ≥ 700 °C. In addition, an internal nitrogen attack to form AlN was also observed for the Al-containing alloys at 900 °C. | en_US |
dc.language.iso | en_US | en_US |
dc.publisher | Elsevier | en_US |
dc.relation.ispartof | Journal of Alloys and Compounds | en_US |
dc.subject | high-entropy superalloys | en_US |
dc.subject | SEM | en_US |
dc.subject | TEM | en_US |
dc.subject | Scales | en_US |
dc.title | The oxidation behavior of Ni2FeCoCrAlx high-entropy alloys in dry air | en_US |
dc.type | journal article | en_US |
dc.identifier.doi | <Go to ISI>://WOS:000547824600006 | - |
dc.identifier.doi | <Go to ISI>://WOS:000547824600006 | - |
dc.identifier.doi | 10.1016/j.jallcom.2020.155518 | - |
dc.identifier.doi | <Go to ISI>://WOS:000547824600006 | - |
dc.identifier.doi | <Go to ISI>://WOS:000547824600006 | - |
dc.identifier.doi | <Go to ISI>://WOS:000547824600006 | - |
dc.identifier.url | <Go to ISI>://WOS:000547824600006 | - |
dc.relation.journalvolume | 836 | en_US |
dc.relation.pages | 155518 | en_US |
item.cerifentitytype | Publications | - |
item.openairetype | journal article | - |
item.openairecristype | http://purl.org/coar/resource_type/c_6501 | - |
item.fulltext | no fulltext | - |
item.grantfulltext | none | - |
item.languageiso639-1 | en_US | - |
crisitem.author.dept | College of Electrical Engineering and Computer Science | - |
crisitem.author.dept | Department of Optoelectronics and Materials Technology | - |
crisitem.author.dept | National Taiwan Ocean University,NTOU | - |
crisitem.author.orcid | https://orcid.org/0000-0001-8791-7775 | - |
crisitem.author.parentorg | National Taiwan Ocean University,NTOU | - |
crisitem.author.parentorg | College of Electrical Engineering and Computer Science | - |
顯示於: | 光電與材料科技學系 |
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