http://scholars.ntou.edu.tw/handle/123456789/4460
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Wu Kai | en_US |
dc.contributor.author | Hsieh, H. H. | en_US |
dc.contributor.author | Nieh, T. G. | en_US |
dc.contributor.author | Kawamura, Y. | en_US |
dc.date.accessioned | 2020-11-19T00:37:48Z | - |
dc.date.available | 2020-11-19T00:37:48Z | - |
dc.date.issued | 2002-11 | - |
dc.identifier.issn | 0966-9795 | - |
dc.identifier.uri | http://scholars.ntou.edu.tw/handle/123456789/4460 | - |
dc.description.abstract | The oxidation behavior of Zr–30Cu–10Al–5Ni bulk metallic glass and its crystalline counterpart was studied over the temperature range of 300–425 °C in dry air. In general, the oxidation kinetics of both amorphous and crystalline alloys followed a two- or three-stage parabolic rate law at T⩾350 °C, while at 300 °C the amorphous alloy oxidized following a linear behavior. The oxidation rate constants for the amorphous alloy are slightly higher than those for the crystalline alloy at 350–400 °C. The scale formed on the amorphous alloy consists of mainly tetragonal-ZrO2 at 300 °C, while a mixture of monoclinic-ZrO2 (m-ZrO2) and tetragonal-ZrO2 (t-ZrO2) and some CuO were detected at higher temperatures. The scale formed on the crystalline alloy, on the other hand, consists of mainly Al2O3, some tetragonal-ZrO2, and a slight amount of monoclinic-ZrO2 at 300 °C. At higher temperatures, the crystalline alloy consists of mainly monoclinic-ZrO2, some CuO and Cu2O, and limited tetragonal-ZrO2. It is suggested that the formation of Al2O3 (at 300 °C) and CuO/Cu2O (at 350-400 °C) on the crystalline alloy is responsible for the reduced oxidation rates as compared with those of amorphous alloy. | en_US |
dc.language.iso | en_US | en_US |
dc.publisher | Elsevier | en_US |
dc.relation.ispartof | Intermetallics | en_US |
dc.subject | B. Oxidation | en_US |
dc.subject | Diffusion | en_US |
dc.title | Oxidation behavior of a Zr–Cu–Al–Ni amorphous alloy in air at 300–425 °C | en_US |
dc.type | journal article | en_US |
dc.identifier.doi | <Go to ISI>://WOS:000180002100031 | - |
dc.identifier.doi | 10.1016/s0966-9795(02)00163-2 | - |
dc.identifier.doi | <Go to ISI>://WOS:000180002100031 | - |
dc.identifier.doi | <Go to ISI>://WOS:000180002100031 | - |
dc.identifier.url | <Go to ISI>://WOS:000180002100031 | |
dc.relation.journalvolume | 10 | en_US |
dc.relation.journalissue | 11-12 | en_US |
dc.relation.pages | 1265-1270 | en_US |
item.cerifentitytype | Publications | - |
item.openairetype | journal article | - |
item.openairecristype | http://purl.org/coar/resource_type/c_6501 | - |
item.fulltext | no fulltext | - |
item.grantfulltext | none | - |
item.languageiso639-1 | en_US | - |
crisitem.author.dept | College of Electrical Engineering and Computer Science | - |
crisitem.author.dept | Department of Optoelectronics and Materials Technology | - |
crisitem.author.dept | National Taiwan Ocean University,NTOU | - |
crisitem.author.orcid | https://orcid.org/0000-0001-8791-7775 | - |
crisitem.author.parentorg | National Taiwan Ocean University,NTOU | - |
crisitem.author.parentorg | College of Electrical Engineering and Computer Science | - |
Appears in Collections: | 光電與材料科技學系 |
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