http://scholars.ntou.edu.tw/handle/123456789/4466
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Wu Kai | en_US |
dc.contributor.author | Kao, P. C. | en_US |
dc.contributor.author | Lin, P. C. | en_US |
dc.contributor.author | Ren, I. F. | en_US |
dc.contributor.author | Jang, J. S. C. | en_US |
dc.date.accessioned | 2020-11-19T00:37:49Z | - |
dc.date.available | 2020-11-19T00:37:49Z | - |
dc.date.issued | 2010-10 | - |
dc.identifier.issn | 0966-9795 | - |
dc.identifier.uri | http://scholars.ntou.edu.tw/handle/123456789/4466 | - |
dc.description.abstract | The effect of Si addition on the oxidation of (Cu43Zr43Al7Ag7)99.5Si0.5 bulk metallic glass (CZ43S-BMG) was investigated over the temperature range of 375–500 °C in dry air. The results generally showed that the oxidation rates of the CZ43S-BMG followed a multi-stage parabolic-rate law, and the oxidation rate constants (kp values) fluctuated with increasing temperature. It was found that the kp values of the CZ43S-BMG were slightly slower than those of the Si-free glassy alloy (Cu43Zr43Al7Ag7, named as CZ43-BMG). The scales formed on the CZ43S-BMG strongly depend on temperature, consisting of 3 different modifications of ZrO2 and CuO, and minor amounts of Cu2O (formed at T ≥ 425 °C) and Al2O3 (only detected at 500 °C). In addition, the glassy substrate remained amorphous nature at T ≤ 400 °C, while it transferred to the crystalline phases of Cu10Zr7, ZrAl, and ZrSi2 after the oxidation at higher temperatures. | en_US |
dc.language.iso | en_US | en_US |
dc.publisher | Elsevier | en_US |
dc.relation.ispartof | Intermetallics | en_US |
dc.subject | B. Oxidation | en_US |
dc.subject | B. Glasses, metallic | en_US |
dc.title | Effects of Si addition on the oxidation behavior of a Cu–Zr-based bulk metallic alloy | en_US |
dc.type | journal article | en_US |
dc.identifier.doi | <Go to ISI>://WOS:000281420700046 | - |
dc.identifier.doi | 10.1016/j.intermet.2010.03.005 | - |
dc.identifier.doi | <Go to ISI>://WOS:000281420700046 | - |
dc.identifier.doi | <Go to ISI>://WOS:000281420700046 | - |
dc.identifier.url | <Go to ISI>://WOS:000281420700046 | |
dc.relation.journalvolume | 18 | en_US |
dc.relation.journalissue | 10 | en_US |
dc.relation.pages | 1994-1999 | en_US |
item.cerifentitytype | Publications | - |
item.openairetype | journal article | - |
item.openairecristype | http://purl.org/coar/resource_type/c_6501 | - |
item.fulltext | no fulltext | - |
item.grantfulltext | none | - |
item.languageiso639-1 | en_US | - |
crisitem.author.dept | College of Electrical Engineering and Computer Science | - |
crisitem.author.dept | Department of Optoelectronics and Materials Technology | - |
crisitem.author.dept | National Taiwan Ocean University,NTOU | - |
crisitem.author.orcid | https://orcid.org/0000-0001-8791-7775 | - |
crisitem.author.parentorg | National Taiwan Ocean University,NTOU | - |
crisitem.author.parentorg | College of Electrical Engineering and Computer Science | - |
顯示於: | 光電與材料科技學系 |
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