| Issue Date | Title | Author(s) | Source | scopus | WOS | Fulltext/Archive link |
|---|---|---|---|---|---|---|
| 2014 | Development of a Novel Nanodiamond-Impregnated Polishing Pad for Chemical Mechanical Polishing of Oxide Film | Jihng-Kuo Ho ; Che-Hsiung Tsai; Ming-Yi Tsai; Jui-Hsuan Chiang | 中國機械工程學刊 |
