http://scholars.ntou.edu.tw/handle/123456789/16030| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | C. H. Chu | en_US |
| dc.contributor.author | C. D. Shiue | en_US |
| dc.contributor.author | H. W. Chen | en_US |
| dc.contributor.author | B. H. Chen | en_US |
| dc.contributor.author | D. Chiang | en_US |
| dc.contributor.author | H. -P. Chiang | en_US |
| dc.contributor.author | D. P. Tsai | en_US |
| dc.date.accessioned | 2021-02-26T07:51:17Z | - |
| dc.date.available | 2021-02-26T07:51:17Z | - |
| dc.date.issued | 2009-10-04 | - |
| dc.identifier.uri | http://scholars.ntou.edu.tw/handle/123456789/16030 | - |
| dc.description | 舉辦地點: Nagasaki Brick Hall, Nagasaki, Japan | en_US |
| dc.language.iso | en | en_US |
| dc.publisher | International Symposium on Optical Memory 2009 | en_US |
| dc.title | Phase-change masking for nanolithography | en_US |
| dc.type | conference paper | en_US |
| dc.relation.conference | International Symposium on Optical Memory 2009 | en_US |
| item.openairecristype | http://purl.org/coar/resource_type/c_5794 | - |
| item.cerifentitytype | Publications | - |
| item.languageiso639-1 | en | - |
| item.fulltext | no fulltext | - |
| item.grantfulltext | none | - |
| item.openairetype | conference paper | - |
| crisitem.author.dept | College of Electrical Engineering and Computer Science | - |
| crisitem.author.dept | Department of Optoelectronics and Materials Technology | - |
| crisitem.author.dept | National Taiwan Ocean University,NTOU | - |
| crisitem.author.orcid | 0000-0003-0752-175X | - |
| crisitem.author.parentorg | National Taiwan Ocean University,NTOU | - |
| crisitem.author.parentorg | College of Electrical Engineering and Computer Science | - |
| Appears in Collections: | 光電與材料科技學系 | |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.
