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  1. National Taiwan Ocean University Research Hub
  2. 電機資訊學院
  3. 光電與材料科技學系
請用此 Handle URI 來引用此文件: http://scholars.ntou.edu.tw/handle/123456789/1828
標題: In-situ magnetic deposition, field effect on sheet resistance of Permalloy films
作者: S.U. Jen
T.C. Wu
C.M. Wong
Y.T. Chen
H.P. Chiang 
關鍵字: Sheet resistance;Permalloy films;Coalescence;Deposition field effect
公開日期: 25-六月-2007
出版社: Elsevier 
卷: 515
期: 18
起(迄)頁: 7382-7386
來源出版物: Thin Solid Films
摘要: 
We have measured the real-time in-situ sheet resistance (R□) of a Permalloy (Py) film during the film-growth period in a vacuum under various magnetic deposition-field (H) conditions: a longitudinal direct-current (dc) field (H = Hx), a transverse dc field (H = Hy), and a rotating field (H = Hr) with the frequency (f) at 0.6, 1.4, 2.5, 10, and 100 Hz, respectively. The results show that R□(Hy) > R□(Hx) ≃ R□(H = 0) ≫ R□(H = Hr), when Py film is just before or near the coalescence stage of the film-growth process. The reason for these phenomena is that a dc field (H = 0, Hx, or Hy) tends to make the structure of the film more anisotropic, while a rotating field (H = Hr) tends to make the film more isotropic. Moreover, based on the quantum tunneling mechanism, the fact that there will be many more tunneling events through which an electron can be transported down a piece-by-piece connected film with an anisotropic than with an isotropic structure should naturally lead to the observed results above. Finally, we also explain why in the R□ versus f plot (under the condition of film thickness tf = 1 nm), there exists a minimum R□ at f = fmin = 2.5 Hz.
URI: http://scholars.ntou.edu.tw/handle/123456789/1828
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2007.03.008
顯示於:光電與材料科技學系

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