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  1. National Taiwan Ocean University Research Hub
  2. 電機資訊學院
  3. 光電與材料科技學系
Please use this identifier to cite or link to this item: http://scholars.ntou.edu.tw/handle/123456789/1828
DC FieldValueLanguage
dc.contributor.authorS.U. Jenen_US
dc.contributor.authorT.C. Wuen_US
dc.contributor.authorC.M. Wongen_US
dc.contributor.authorY.T. Chenen_US
dc.contributor.authorH.P. Chiangen_US
dc.date.accessioned2020-11-17T01:11:20Z-
dc.date.available2020-11-17T01:11:20Z-
dc.date.issued2007-06-25-
dc.identifier.issn0040-6090-
dc.identifier.urihttp://scholars.ntou.edu.tw/handle/123456789/1828-
dc.description.abstractWe have measured the real-time in-situ sheet resistance (R□) of a Permalloy (Py) film during the film-growth period in a vacuum under various magnetic deposition-field (H) conditions: a longitudinal direct-current (dc) field (H = Hx), a transverse dc field (H = Hy), and a rotating field (H = Hr) with the frequency (f) at 0.6, 1.4, 2.5, 10, and 100 Hz, respectively. The results show that R□(Hy) > R□(Hx) ≃ R□(H = 0) ≫ R□(H = Hr), when Py film is just before or near the coalescence stage of the film-growth process. The reason for these phenomena is that a dc field (H = 0, Hx, or Hy) tends to make the structure of the film more anisotropic, while a rotating field (H = Hr) tends to make the film more isotropic. Moreover, based on the quantum tunneling mechanism, the fact that there will be many more tunneling events through which an electron can be transported down a piece-by-piece connected film with an anisotropic than with an isotropic structure should naturally lead to the observed results above. Finally, we also explain why in the R□ versus f plot (under the condition of film thickness tf = 1 nm), there exists a minimum R□ at f = fmin = 2.5 Hz.en_US
dc.language.isoenen_US
dc.publisherElsevier en_US
dc.relation.ispartofThin Solid Filmsen_US
dc.subjectSheet resistanceen_US
dc.subjectPermalloy filmsen_US
dc.subjectCoalescenceen_US
dc.subjectDeposition field effecten_US
dc.titleIn-situ magnetic deposition, field effect on sheet resistance of Permalloy filmsen_US
dc.typejournal articleen_US
dc.identifier.doi10.1016/j.tsf.2007.03.008-
dc.identifier.isi000247897900057-
dc.relation.journalvolume515en_US
dc.relation.journalissue18en_US
dc.relation.pages7382-7386en_US
item.openairetypejournal article-
item.fulltextno fulltext-
item.openairecristypehttp://purl.org/coar/resource_type/c_6501-
item.grantfulltextnone-
item.cerifentitytypePublications-
item.languageiso639-1en-
crisitem.author.deptCollege of Electrical Engineering and Computer Science-
crisitem.author.deptDepartment of Optoelectronics and Materials Technology-
crisitem.author.deptNational Taiwan Ocean University,NTOU-
crisitem.author.orcid0000-0003-0752-175X-
crisitem.author.parentorgNational Taiwan Ocean University,NTOU-
crisitem.author.parentorgCollege of Electrical Engineering and Computer Science-
Appears in Collections:光電與材料科技學系
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