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Please use this identifier to cite or link to this item: http://scholars.ntou.edu.tw/handle/123456789/22841
Title: Ultraviolet emission efficiency enhancement of a-plane AlGaN/GaN multiple-quantum-wells with increasing quantum well thickness
Authors: Huei-Min Huang
Chiao-Yun Chang 
Yu-Pin Lan
Tien-Chang Lu
Hao-Chung Kuo
Shing-Chung Wang
Keywords: VAPOR-PHASE EPITAXY;GALLIUM NITRIDE;GAN;CATHODOLUMINESCENCE;OVERGROWTH;REDUCTION;DEFECTS
Issue Date: Jun-2012
Publisher: AIP Publishing
Journal Volume: 100
Journal Issue: 26
Source: APPLIED PHYSICS LETTERS
Abstract: 
The defect-induced carrier localization in nonpolar a-plane (Al,Ga)N/GaN multiple quantum wells (MQWs) structures with different well thickness have been investigated. A strong variation of temperature-dependent photoluminescence peak energy was observed and attributed to the existence of the localized states. The degree of carrier localization in these defect-induced states was more prominent in the case of MQWs with the wider well width. In addition, the ultraviolet light emission efficiency revealed a 3-fold enhancement with increasing the well width from 1.6 nm to 7.3 nm, due to the strong carrier localization generated from the quantum-wire-like features formed by the intersection between basal stacking faults and quantum wells. (C) 2012 American Institute of Physics.
URI: http://scholars.ntou.edu.tw/handle/123456789/22841
ISSN: 0003-6951
DOI: 10.1063/1.4730438
Appears in Collections:電機工程學系

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