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  1. National Taiwan Ocean University Research Hub
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  3. 光電與材料科技學系
請用此 Handle URI 來引用此文件: http://scholars.ntou.edu.tw/handle/123456789/23612
標題: Effects of nitrogen flow ratio on the structural, mechanical, and anticorrosive properties of co-sputtered (NbTaMoW)Nx films
作者: Lee, Jyh-Wei
Chen, Chun-Yen
Chen, Yi-Jyun
Tzeng, Chin-Han
Chen, Yung-, I 
關鍵字: Corrosion resistance;High-entropy alloys;Mechanical properties;Medium-entropy alloys;Transition metal nitride films;Phase transformation
公開日期: 1-十一月-2022
出版社: ELSEVIER
卷: 21
起(迄)頁: 1890-1902
來源出版物: JOURNAL OF MATERIALS RESEARCH AND TECHNOLOGY-JMR&T
摘要: 
In this study (NbTaMoW)Nx films were fabricated through reactive co-sputtering using four pure-element targets at various nitrogen flow ratios (RN2). It was also explored the phase structures, mechanical properties, and corrosion resistance properties of these films. The results indicated that the stoichiometric ratio x of the (NbTaMoW)Nx films increased with increasing RN2, accompanied by body-centered cubic metal phases transformation to face -centered cubic covalent nitride phases. These face-centered cubic phases were classified into phases with M2N-dominant and phases with MN-dominant structures. The results also indicated that the (NbTaMoW)Nx films prepared at RN2 values of 0.2-0.4 exhibited high hardness and Young's modulus values of 29.3-31.7 and 333-396 GPa, respectively. Using potentiodynamic polarization and electrochemical impedance spectroscopy, it was determined that the corrosion resistance of the SUS420 substrate was effectively improved with the deposition of one nitrogen-free NbTaMoW film and four nitrogen-containing (NbTaMoW)Nx films. It was also observed the highest corrosion resistance in the (Nb0.16-Ta0.29Mo0.32W0.23)N0.07 film because of its dense microstructure.(c) 2022 The Author(s). Published by Elsevier B.V. This is an open access article under the CC BY license (http://creativecommons.org/licenses/by/4.0/).
URI: http://scholars.ntou.edu.tw/handle/123456789/23612
ISSN: 2238-7854
DOI: 10.1016/j.jmrt.2022.10.033
顯示於:光電與材料科技學系

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