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  1. National Taiwan Ocean University Research Hub
  2. 電機資訊學院
  3. 光電與材料科技學系
請用此 Handle URI 來引用此文件: http://scholars.ntou.edu.tw/handle/123456789/24534
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dc.contributor.authorLee, Pee-Yewen_US
dc.contributor.authorHuang, Hung Jien_US
dc.contributor.authorKo, Tsung-Shineen_US
dc.contributor.authorHung, Ying-Lunen_US
dc.contributor.authorWu, Li-Yanen_US
dc.contributor.authorFan, Jia-Junen_US
dc.contributor.authorLin, Yung-Shengen_US
dc.date.accessioned2024-03-04T08:53:09Z-
dc.date.available2024-03-04T08:53:09Z-
dc.date.issued2023-11-01-
dc.identifier.issn1087-1357-
dc.identifier.urihttp://scholars.ntou.edu.tw/handle/123456789/24534-
dc.description.abstractThe fluoride-assisted galvanic replacement reaction is a conventional method for fabricating metallic dendrites on silicon wafers. However, whether bubbles affect manufacturing metallic dendrites is unclear. This study investigated the effects of bubbles on manufacturing Au dendrites and silicon nanowires through metal-assisted chemical etching. The results of manufacture under three conditions (standard, shaking, and vacuum conditions) were compared. Synchronous growth of Au dendrites and silicon nanowires were observed on the silicon wafers. The Au dendrite deposition rate was higher than the silicon etching rate. Compared with the standard condition, the vacuum condition increased the synthesis rates of Au dendrites and silicon nanowires by 1.1 and 0.2 mu m/min, respectively. Therefore, the elimination of bubbles by vacuum can considerably accelerate manufacturing Au dendrites and silicon nanowires.en_US
dc.language.isoEnglishen_US
dc.publisherASMEen_US
dc.relation.ispartofJOURNAL OF MANUFACTURING SCIENCE AND ENGINEERING-TRANSACTIONS OF THE ASMEen_US
dc.subjectbubbleen_US
dc.subjectfluoride-assisted galvanic replacement reactionen_US
dc.subjectgold dendriteen_US
dc.subjectmetal-assisted chemical etchingen_US
dc.subjectmicro- and nano-machining and processingen_US
dc.titleEffects of Bubbles on Manufacturing Gold Dendrites and Silicon Nanowires Through the Fluoride-Assisted Galvanic Replacement Reactionen_US
dc.typejournal articleen_US
dc.identifier.doi10.1115/1.4062878-
dc.identifier.isiWOS:001084576800008-
dc.relation.journalvolume145en_US
dc.relation.journalissue11en_US
dc.identifier.eissn1528-8935-
item.openairetypejournal article-
item.languageiso639-1English-
item.cerifentitytypePublications-
item.openairecristypehttp://purl.org/coar/resource_type/c_6501-
item.fulltextno fulltext-
item.grantfulltextnone-
crisitem.author.deptCollege of Electrical Engineering and Computer Science-
crisitem.author.deptDepartment of Optoelectronics and Materials Technology-
crisitem.author.deptNational Taiwan Ocean University,NTOU-
crisitem.author.parentorgNational Taiwan Ocean University,NTOU-
crisitem.author.parentorgCollege of Electrical Engineering and Computer Science-
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