Skip navigation
  • 中文
  • English

DSpace CRIS

  • DSpace logo
  • 首頁
  • 研究成果檢索
  • 研究人員
  • 單位
  • 計畫
  • 分類瀏覽
    • 研究成果檢索
    • 研究人員
    • 單位
    • 計畫
  • 機構典藏
  • SDGs
  • 登入
  • 中文
  • English
  1. National Taiwan Ocean University Research Hub
  2. 電機資訊學院
  3. 光電與材料科技學系
請用此 Handle URI 來引用此文件: http://scholars.ntou.edu.tw/handle/123456789/25880
標題: Enhancing the performance of Bi2O3-ZnO semiconductor bilayers for photoelectrochemical electrodes by strategically engineering oxygen vacancies
作者: Liang, Yuan-Chang 
Wang, Po-Hsiang
關鍵字: Semiconductor;Photoelectrochemical electrodes;Heterostructure;Process conditions;Oxygen vacancy
公開日期: 1-六月-2025
出版社: VIETNAM NATL UNIV
卷: 10
期: 2
來源出版物: JOURNAL OF SCIENCE-ADVANCED MATERIALS AND DEVICES
摘要: 
This study successfully synthesized sheet-like triangular Bi2O3 using the hydrothermal method and subsequently annealed it in a hydrogen-contained atmosphere to effectively introduce oxygen vacancies. ZnO was fabricated through sputtering at elevated substrate temperatures, which also facilitated the formation of oxygen vacancies. We prepared Bi2O3/ZnO composites to assess their performance in photoelectrochemical (PEC) and photo-catalytic applications under illumination. Oxygen vacancies significantly enhance the materials' charge separation capabilities, resulting in increased photocurrent density and reduced interfacial resistance while also boosting the number of surface active sites. Furthermore, control over the annealing conditions and substrate temperatures can optimize the generation of oxygen vacancies, thereby enhancing the performance of the composites. Introducing oxygen vacancies and establishing a Z-scheme structure in Bi2O3 and ZnO represent effective strategies for advancing the potential applications of oxide semiconductor composites in PEC electrodes.
URI: http://scholars.ntou.edu.tw/handle/123456789/25880
ISSN: 2468-2284
DOI: 10.1016/j.jsamd.2025.100895
顯示於:光電與材料科技學系

顯示文件完整紀錄

Page view(s)

21
checked on 2025/6/30

Google ScholarTM

檢查

Altmetric

Altmetric

TAIR相關文章


在 IR 系統中的文件,除了特別指名其著作權條款之外,均受到著作權保護,並且保留所有的權利。

瀏覽
  • 機構典藏
  • 研究成果檢索
  • 研究人員
  • 單位
  • 計畫
DSpace-CRIS Software Copyright © 2002-  Duraspace   4science - Extension maintained and optimized by NTU Library Logo 4SCIENCE 回饋