http://scholars.ntou.edu.tw/handle/123456789/4429| DC 欄位 | 值 | 語言 |
|---|---|---|
| dc.contributor.author | Zhi-Ting Zheng | en_US |
| dc.contributor.author | Wu Kai | en_US |
| dc.contributor.author | Yu-Ren Huang | en_US |
| dc.contributor.author | Yung-I Chen | en_US |
| dc.date.accessioned | 2020-11-19T00:37:43Z | - |
| dc.date.available | 2020-11-19T00:37:43Z | - |
| dc.date.issued | 2017-06 | - |
| dc.identifier.issn | 0169-4332 | - |
| dc.identifier.uri | http://scholars.ntou.edu.tw/handle/123456789/4429 | - |
| dc.description.abstract | Ru0.63Al0.37 coatings were deposited through a cyclical gradient concentration deposition at 400 °C with a substrate-holder rotation speed of 1 rpm by direct current magnetron cosputtering. Scanning electron microscopy revealed that the as-deposited coatings exhibited a multilayer structure along with the columnar structure. The oxidation behavior of the Ru0.63Al0.37 coatings was examined through X-ray diffraction, Auger electron spectroscopy, transmission electron microscopy, and X-ray photoelectron spectroscopy. Oxidation kinetics was measured using a thermogravimetric analyzer. Internal oxidation was observed for Ru0.63Al0.37 coatings annealed in a 1% O2–99% Ar atmosphere at 400–600 °C accompanied with activation energies of 72–84 kJ/mol. By contrast, external oxidation was observed after annealing at 700–800 °C, resulting in the formation of a continuous alumina scale consisting of crystalline δ-Al2O3 domains, which can be attributable to the outward diffusion of Al. | en_US |
| dc.language.iso | en_US | en_US |
| dc.publisher | Elsevier | en_US |
| dc.relation.ispartof | Applied Surface Science | en_US |
| dc.subject | Auger electron spectroscopy | en_US |
| dc.subject | Kinetics | en_US |
| dc.subject | Multilayer coatings | en_US |
| dc.subject | Nanostructure | en_US |
| dc.subject | Oxidation | en_US |
| dc.subject | X-ray photoelectron spectroscopy | en_US |
| dc.title | Oxidation behavior of Ru–Al multilayer coatings | en_US |
| dc.type | journal article | en_US |
| dc.identifier.doi | <Go to ISI>://WOS:000398011600001 | - |
| dc.identifier.doi | <Go to ISI>://WOS:000398011600001 | - |
| dc.identifier.doi | <Go to ISI>://WOS:000398011600001 | - |
| dc.identifier.doi | 10.1016/j.apsusc.2017.02.096 | - |
| dc.identifier.doi | <Go to ISI>://WOS:000398011600001 | - |
| dc.identifier.doi | <Go to ISI>://WOS:000398011600001 | - |
| dc.identifier.url | <Go to ISI>://WOS:000398011600001 | - |
| dc.relation.journalvolume | 406 | en_US |
| dc.relation.pages | 1-7 | en_US |
| item.openairetype | journal article | - |
| item.fulltext | no fulltext | - |
| item.openairecristype | http://purl.org/coar/resource_type/c_6501 | - |
| item.grantfulltext | none | - |
| item.cerifentitytype | Publications | - |
| item.languageiso639-1 | en_US | - |
| crisitem.author.dept | College of Electrical Engineering and Computer Science | - |
| crisitem.author.dept | Department of Optoelectronics and Materials Technology | - |
| crisitem.author.dept | National Taiwan Ocean University,NTOU | - |
| crisitem.author.dept | College of Electrical Engineering and Computer Science | - |
| crisitem.author.dept | Department of Optoelectronics and Materials Technology | - |
| crisitem.author.dept | National Taiwan Ocean University,NTOU | - |
| crisitem.author.orcid | https://orcid.org/0000-0001-8791-7775 | - |
| crisitem.author.orcid | 0000-0003-0689-5709 | - |
| crisitem.author.parentorg | National Taiwan Ocean University,NTOU | - |
| crisitem.author.parentorg | College of Electrical Engineering and Computer Science | - |
| crisitem.author.parentorg | National Taiwan Ocean University,NTOU | - |
| crisitem.author.parentorg | College of Electrical Engineering and Computer Science | - |
| 顯示於: | 光電與材料科技學系 | |
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