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  1. National Taiwan Ocean University Research Hub
  2. 電機資訊學院
  3. 光電與材料科技學系
Please use this identifier to cite or link to this item: http://scholars.ntou.edu.tw/handle/123456789/4437
DC FieldValueLanguage
dc.contributor.authorHer-Hsiung Huangen_US
dc.contributor.authorHsun-Miao Huangen_US
dc.contributor.authorMau-Chin Linen_US
dc.contributor.authorWei Zhangen_US
dc.contributor.authorYing-Sui Sunen_US
dc.contributor.authorWu Kaien_US
dc.contributor.authorPeter K.Liawen_US
dc.date.accessioned2020-11-19T00:37:45Z-
dc.date.available2020-11-19T00:37:45Z-
dc.date.issued2014-12-
dc.identifier.issn0925-8388-
dc.identifier.urihttp://scholars.ntou.edu.tw/handle/123456789/4437-
dc.description.abstractImproving the resistance of bulk metallic glass (BMG) to corrosion, particularly pitting, is crucial to the further development of this material. This study employed surface treatment based on nitrogen plasma immersion ion implantation (N-PIII) to enhance the bio-corrosion resistance of Ni-free Zr62.5Cu22.5Fe5Al10 BMG for application in bone implants. Resistance to bio-corrosion was evaluated by establishing potentiodynamic polarization curves in artificial saliva (AS) and simulated body fluid (SBF). Commercial pure Ti was used as the control. Results demonstrate that N-PIII treatment did not alter the bulk amorphous structure of Zr62.5Cu22.5Fe5Al10 BMG. Following N-PIII treatment, a nitride-containing 15 nm thick oxide film was formed on the BMG. This film significantly improved resistance to bio-corrosion in both AS and SBF solutions. The N-PIII-treated BMG presented lower corrosion rates (50–67% less) and higher corrosion potential (800–1100 mV more) than that observed in untreated BMG and Ti. The N-PIII treatment also significantly improved resistance of the BMG to pitting (increased pitting potential by 500–700 mV). This is the first report of the outstanding resistance of Ni-free Zr-based BMG to bio-corrosion (i.e. corrosion rate 0.01 μA/cm2; pitting potential >1200 mV; corrosion potential >270 mV) in simulated biological environments.en_US
dc.language.isoen_USen_US
dc.publisherElsevieren_US
dc.relation.ispartofJournal of Alloys and Compoundsen_US
dc.subjectBio-corrosion resistanceen_US
dc.subjectNi-free Zr-based bulk metallic glassen_US
dc.subjectNitrogen plasma immersion ion implantationen_US
dc.subjectPitting corrosionen_US
dc.titleEnhancing the bio-corrosion resistance of Ni-free ZrCuFeAl bulk metallic glass through nitrogen plasma immersion ion implantationen_US
dc.typejournal articleen_US
dc.identifier.doi<Go to ISI>://WOS:000343613600137-
dc.identifier.doi<Go to ISI>://WOS:000343613600137-
dc.identifier.doi10.1016/j.jallcom.2014.01.098-
dc.identifier.doi<Go to ISI>://WOS:000343613600137-
dc.identifier.doi<Go to ISI>://WOS:000343613600137-
dc.identifier.url<Go to ISI>://WOS:000343613600137
dc.relation.journalvolume615en_US
dc.relation.pagesS660-S665en_US
item.openairetypejournal article-
item.cerifentitytypePublications-
item.openairecristypehttp://purl.org/coar/resource_type/c_6501-
item.grantfulltextnone-
item.fulltextno fulltext-
item.languageiso639-1en_US-
crisitem.author.deptCollege of Electrical Engineering and Computer Science-
crisitem.author.deptDepartment of Optoelectronics and Materials Technology-
crisitem.author.deptNational Taiwan Ocean University,NTOU-
crisitem.author.orcidhttps://orcid.org/0000-0001-8791-7775-
crisitem.author.parentorgNational Taiwan Ocean University,NTOU-
crisitem.author.parentorgCollege of Electrical Engineering and Computer Science-
Appears in Collections:光電與材料科技學系
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