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  1. National Taiwan Ocean University Research Hub
  2. 電機資訊學院
  3. 光電與材料科技學系
請用此 Handle URI 來引用此文件: http://scholars.ntou.edu.tw/handle/123456789/4446
DC 欄位值語言
dc.contributor.authorWu Kaien_US
dc.contributor.authorY.R. Chenen_US
dc.contributor.authorT.H. Hoen_US
dc.contributor.authorH.H. Hsiehen_US
dc.contributor.authorD.C.Qiaoen_US
dc.contributor.authorF.Jiangen_US
dc.contributor.authorG.Fanen_US
dc.contributor.authorP.K.Liawen_US
dc.date.accessioned2020-11-19T00:37:46Z-
dc.date.available2020-11-19T00:37:46Z-
dc.date.issued2009-08-
dc.identifier.issn0925-8388-
dc.identifier.urihttp://scholars.ntou.edu.tw/handle/123456789/4446-
dc.description.abstractThe oxidation behavior of the Zr58Cu22Al12Fe8 bulk metallic glasses (ZC4-BMG) was studied over the temperature range of 350–550 °C in dry air. The oxidation kinetics of the ZC4-BMG generally follow a multi-stage parabolic-rate law, and the steady-state parabolic-rate constants (kp values) increased with increasing the temperature when it is below the glass transition temperature (Tg = 413.3 °C). Conversely, the kp values were nearly identical from 400 to 550 °C. The scales formed on ZC4-BMG were composed mostly of tetragonal-ZrO2 (t-ZrO2) and minor amounts of Al2O3 and monoclinic-ZrO2 (m-ZrO2). The amounts of both Al2O3 and m-ZrO2 increased with increasing the temperature. In addition, the amorphous substrate remained unchanged after the oxidation for 36 h at T ≤ 375 °C. However, it transformed into different crystalline phases at higher temperatures, which are strongly dependent on the temperature and duration of time.en_US
dc.language.isoen_USen_US
dc.publisherElsevieren_US
dc.relation.ispartofJournal of Alloys and Compoundsen_US
dc.subjectBulk metallic glassesen_US
dc.subjectOxidationen_US
dc.subjectX-ray diffractionen_US
dc.subjectThermal analysisen_US
dc.subjectMicroscopyen_US
dc.titleAir oxidation of a Zr58Cu22Al12Fe8 bulk metallic glass at 350–550 °Cen_US
dc.typejournal articleen_US
dc.identifier.doi<Go to ISI>://WOS:000270619600125-
dc.identifier.doi<Go to ISI>://WOS:000270619600125-
dc.identifier.doi10.1016/j.jallcom.2008.10.133-
dc.identifier.doi<Go to ISI>://WOS:000270619600125-
dc.identifier.doi<Go to ISI>://WOS:000270619600125-
dc.identifier.doi<Go to ISI>://WOS:000270619600125-
dc.identifier.url<Go to ISI>://WOS:000270619600125
dc.relation.journalvolume483en_US
dc.relation.journalissue1-2en_US
dc.relation.pages519-525en_US
item.openairecristypehttp://purl.org/coar/resource_type/c_6501-
item.cerifentitytypePublications-
item.languageiso639-1en_US-
item.fulltextno fulltext-
item.grantfulltextnone-
item.openairetypejournal article-
crisitem.author.deptCollege of Electrical Engineering and Computer Science-
crisitem.author.deptDepartment of Optoelectronics and Materials Technology-
crisitem.author.deptNational Taiwan Ocean University,NTOU-
crisitem.author.orcidhttps://orcid.org/0000-0001-8791-7775-
crisitem.author.parentorgNational Taiwan Ocean University,NTOU-
crisitem.author.parentorgCollege of Electrical Engineering and Computer Science-
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