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  3. 光電與材料科技學系
請用此 Handle URI 來引用此文件: http://scholars.ntou.edu.tw/handle/123456789/4470
DC 欄位值語言
dc.contributor.authorWu Kaien_US
dc.contributor.authorLeu, C. J.en_US
dc.contributor.authorWu, Y. J.en_US
dc.date.accessioned2020-11-19T00:37:50Z-
dc.date.available2020-11-19T00:37:50Z-
dc.date.issued1998-08-
dc.identifier.issn0030-770X-
dc.identifier.urihttp://scholars.ntou.edu.tw/handle/123456789/4470-
dc.description.abstractThe high-temperature sulfidation behavior of 310stainless steel (310SS) with Mo and Al additions (up to10 at.%) was studied over the temperature range700-900°C in pure-sulfur vapor over the range of 10-3 to 10-1 atm. Thecorrosion kinetics followed the parabolic rate law inall cases and the sulfidation rates increased withincreasing temperature and sulfur pressure. Thesulfidation rates decreased with increasing Mo and Al contents and it wasfound that the addition of 10 at.% Mo resulted in themost pronounced reduction among the alloys studied. Thescales formed on 310SS with Mo additions were complex, consisting of an outer layer of ironsulfide (with dissolved Cr), (Fe,Ni)9S8, andCr2S3/Cr3S4(with dissolved Fe), and an inner heterophasic layer ofFe1-xS,Cr2S3/Cr3S4,NiCr2S4,Fe1.25Mo6S7.7, FeMo2S4, andMoS2. The scales formed on 310SS with Mo andAl additions had a similar mixture as above, except thatAl0.55Mo2S4 was alsoobserved in the inner layer. The formation ofMoS2 andAl0.55Mo2S4 partly blocked the transport of cations throughthe inner scale, resulting in the reduction of thesulfidation rates compared to 310SS.en_US
dc.language.isoen_USen_US
dc.publisherSpringer Natureen_US
dc.relation.ispartofOxidation of Metalsen_US
dc.subjectSULFIDATIONen_US
dc.subject310SSen_US
dc.subjectMOen_US
dc.subjectAlen_US
dc.subjectFe1.25Mo6S7.7en_US
dc.subjectFeMo2S4en_US
dc.subjectMoS2en_US
dc.subjectAl0.55Mo2S4en_US
dc.titleEffects of Mo and Al additions on the sulfidation behavior of 310 stainless steelen_US
dc.typejournal articleen_US
dc.identifier.doi<Go to ISI>://WOS:000075336400005-
dc.identifier.doi<Go to ISI>://WOS:000075336400005-
dc.identifier.doi<Go to ISI>://WOS:000075336400005-
dc.identifier.doi<Go to ISI>://WOS:000075336400005-
dc.identifier.doi10.1023/a:1018875918487-
dc.identifier.doi<Go to ISI>://WOS:000075336400005-
dc.identifier.doi<Go to ISI>://WOS:000075336400005-
dc.identifier.url<Go to ISI>://WOS:000075336400005
dc.relation.journalvolume50en_US
dc.relation.journalissue1-2en_US
dc.relation.pages89–122en_US
item.openairecristypehttp://purl.org/coar/resource_type/c_6501-
item.cerifentitytypePublications-
item.languageiso639-1en_US-
item.fulltextno fulltext-
item.grantfulltextnone-
item.openairetypejournal article-
crisitem.author.deptCollege of Electrical Engineering and Computer Science-
crisitem.author.deptDepartment of Optoelectronics and Materials Technology-
crisitem.author.deptNational Taiwan Ocean University,NTOU-
crisitem.author.orcidhttps://orcid.org/0000-0001-8791-7775-
crisitem.author.parentorgNational Taiwan Ocean University,NTOU-
crisitem.author.parentorgCollege of Electrical Engineering and Computer Science-
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