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  1. National Taiwan Ocean University Research Hub
  2. 電機資訊學院
  3. 光電與材料科技學系
請用此 Handle URI 來引用此文件: http://scholars.ntou.edu.tw/handle/123456789/4471
DC 欄位值語言
dc.contributor.authorWu Kaien_US
dc.contributor.authorLeu, C. T.en_US
dc.contributor.authorLee, P. Y.en_US
dc.date.accessioned2020-11-19T00:37:50Z-
dc.date.available2020-11-19T00:37:50Z-
dc.date.issued1996-10-
dc.identifier.issn0030-770X-
dc.identifier.urihttp://scholars.ntou.edu.tw/handle/123456789/4471-
dc.description.abstractHigh-temperature sulfidation behavior of 310 stainless steel was studied over the temperature range of 700–900°C above a pure sulfur pool with the sulfurvapor range of 10−4–10−1 atm. The corrosion kinetics followed the parabolic rate law in all cases. The corrosion rates increased with increasing temperature and sulfur pressure. The scales formed on 310 stainless steel were complex and multilayered. The outer scale consisted of iron sulfide (with dissolved Cr), (Fe, Ni)9S8 and chromium sulfides (Cr2S3 and Cr3S4 with dissolved Fe), while the inner layer was a heterophasic mixture of Cr2S3, Cr3S4, NiCr2S4, and Fe1−xS. Platinum markers were found to be located at the interface between the inner and outer scales, suggesting that the outer scale grew by the outward transport of cations (Fe, Ni, and Cr), and the inner scale grew by the inward transport of sulfur. The formation of Cr2S3, Cr3S4, and NiCr2S4 partly blocked the transport of iron through the inner scale, resulting in a reduction of the corrosion rates as compared with the results in the literature.en_US
dc.language.isoen_USen_US
dc.publisherSpringer Natureen_US
dc.relation.ispartofOxidation of Metalsen_US
dc.subjectcorrosionen_US
dc.subject310 stainless steelen_US
dc.subject(Fe, Ni)9S8en_US
dc.subjectCr2S3en_US
dc.subjectCr3S4en_US
dc.subjectNiCr2S4en_US
dc.titleEffects of sulfur pressure on the sulfidation behavior of 310 stainless steelen_US
dc.typejournal articleen_US
dc.identifier.doi<Go to ISI>://WOS:A1996VF48900001-
dc.identifier.doi<Go to ISI>://WOS:A1996VF48900001-
dc.identifier.doi<Go to ISI>://WOS:A1996VF48900001-
dc.identifier.doi10.1007/bf01050796-
dc.identifier.doi<Go to ISI>://WOS:A1996VF48900001-
dc.identifier.doi<Go to ISI>://WOS:A1996VF48900001-
dc.identifier.url<Go to ISI>://WOS:A1996VF48900001
dc.relation.journalvolume46en_US
dc.relation.journalissue3-4en_US
dc.relation.pages185–211en_US
item.openairecristypehttp://purl.org/coar/resource_type/c_6501-
item.cerifentitytypePublications-
item.languageiso639-1en_US-
item.fulltextno fulltext-
item.grantfulltextnone-
item.openairetypejournal article-
crisitem.author.deptCollege of Electrical Engineering and Computer Science-
crisitem.author.deptDepartment of Optoelectronics and Materials Technology-
crisitem.author.deptNational Taiwan Ocean University,NTOU-
crisitem.author.orcidhttps://orcid.org/0000-0001-8791-7775-
crisitem.author.parentorgNational Taiwan Ocean University,NTOU-
crisitem.author.parentorgCollege of Electrical Engineering and Computer Science-
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