http://scholars.ntou.edu.tw/handle/123456789/4493| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Chen, W. S. | en_US |
| dc.contributor.author | Chia-Yen Hu | en_US |
| dc.contributor.author | Chiem-Lum Huang | en_US |
| dc.contributor.author | Wu Kai | en_US |
| dc.contributor.author | Yuan-Chang Liang | en_US |
| dc.date.accessioned | 2020-11-19T00:37:53Z | - |
| dc.date.available | 2020-11-19T00:37:53Z | - |
| dc.date.issued | 2011-09 | - |
| dc.identifier.issn | 0272-8842 | - |
| dc.identifier.uri | http://scholars.ntou.edu.tw/handle/123456789/4493 | - |
| dc.description.abstract | In this study, we investigated the effects of forming gas (7% H2 + 93% Ar) annealing (FGA) and recovery annealing (RA) in ambient oxygen on the structure and electrical properties of BiFeO3 (BFO) thin films. X-ray diffraction results indicate that BFO remains in the perovskite phase following FGA. However, the spatial distribution of current maps obtained by conductive atomic force microscopy shows that FGA-treated BFO thin films are less electrically insulating than those without prepared thermal annealing. Recovery annealing improves the structural and chemical homogeneity of the FGA-treated films, thereby increasing the electrical resistance of the films. | en_US |
| dc.language.iso | en_US | en_US |
| dc.publisher | Elsevier | en_US |
| dc.relation.ispartof | Ceramics International | en_US |
| dc.subject | A. Films | en_US |
| dc.subject | B. Defects | en_US |
| dc.subject | B. Surfaces | en_US |
| dc.subject | C. Electrical properties | en_US |
| dc.subject | D. Perovskites | en_US |
| dc.title | Annealing-induced changes in the nanoscale electrical homogeneity of bismuth ferrite dielectric thin films | en_US |
| dc.type | journal article | en_US |
| dc.identifier.doi | <Go to ISI>://WOS:000293759300047 | - |
| dc.identifier.doi | <Go to ISI>://WOS:000293759300047 | - |
| dc.identifier.doi | 10.1016/j.ceramint.2011.03.029 | - |
| dc.identifier.doi | <Go to ISI>://WOS:000293759300047 | - |
| dc.identifier.doi | <Go to ISI>://WOS:000293759300047 | - |
| dc.identifier.url | <Go to ISI>://WOS:000293759300047 | - |
| dc.relation.journalvolume | 37 | en_US |
| dc.relation.journalissue | 7 | en_US |
| dc.relation.pages | 2391-2396 | en_US |
| item.openairetype | journal article | - |
| item.fulltext | no fulltext | - |
| item.openairecristype | http://purl.org/coar/resource_type/c_6501 | - |
| item.grantfulltext | none | - |
| item.cerifentitytype | Publications | - |
| item.languageiso639-1 | en_US | - |
| crisitem.author.dept | College of Electrical Engineering and Computer Science | - |
| crisitem.author.dept | Department of Optoelectronics and Materials Technology | - |
| crisitem.author.dept | National Taiwan Ocean University,NTOU | - |
| crisitem.author.dept | College of Electrical Engineering and Computer Science | - |
| crisitem.author.dept | Department of Optoelectronics and Materials Technology | - |
| crisitem.author.dept | National Taiwan Ocean University,NTOU | - |
| crisitem.author.orcid | https://orcid.org/0000-0001-8791-7775 | - |
| crisitem.author.parentorg | National Taiwan Ocean University,NTOU | - |
| crisitem.author.parentorg | College of Electrical Engineering and Computer Science | - |
| crisitem.author.parentorg | National Taiwan Ocean University,NTOU | - |
| crisitem.author.parentorg | College of Electrical Engineering and Computer Science | - |
| Appears in Collections: | 光電與材料科技學系 | |
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