Modeling, qualitative analysis, and performance evaluation of the etching area in an IC wafer fabrication system using Petri nets

Please use this identifier to cite or link to this item: http://scholars.ntou.edu.tw/handle/123456789/8544

Title:	Modeling, qualitative analysis, and performance evaluation of the etching area in an IC wafer fabrication system using Petri nets
Authors:	Mu-Der Jeng Xie, X. L. Chou, S. W.
Issue Date:	Aug-1998
Journal Volume:	11
Journal Issue:	3
Source:	Ieee Transactions on Semiconductor Manufacturing
URI:	http://scholars.ntou.edu.tw/handle/123456789/8544
ISSN:	0894-6507
DOI:	://WOS:000075140600003
Appears in Collections:	電機工程學系

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