Issue Date | Title | Author(s) | ???itemlist.dc.relation.ispartof??? | ???itemlist.crismetrics_wos??? | ???itemlist.bitstreamformat??? |
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1995 | THERMOMECHANICAL RESPONSE ANALYSIS OF LITHOGRAPHIC MASK STRUCTURE USING FINITE-ELEMENT METHOD | Li, D. C.; Chyuan, S. W.; Jeng-Tzong Chen ; Sun, C. Y. | Jsme International Journal Series a-Mechanics and Material Engineering |