http://scholars.ntou.edu.tw/handle/123456789/23025
Title: | A Ge-rich SiGe Mode-Locker for Erbium-doped Fiber Lasers | Authors: | Chih-I Wu Gong-Ru Lin Chi-Cheng Yang Chih-Hsien Cheng Ting-Hui Chen Yung-Hsiang Lin Yu-Chieh Chi Wei-Hsuan Tseng Po-Han Chang Cheng-Ying Chen Kuei-Hsien Chen Li-Chyong Chen |
Keywords: | NANOTUBE SATURABLE ABSORBER;OPTICAL LOOP MIRROR;GRAPHENE OXIDE;GERMANIUM;LOCKING;SILICON;ALLOYS;MODULATION;SYSTEMS;SOLITON | Issue Date: | Apr-2017 | Publisher: | EEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC | Journal Volume: | 24 | Journal Issue: | 3 | Source: | IEEE Journal of Selected Topics in Quantum Electronics | Abstract: | A nonstoichiometric Si1-xGex with composition ratio dependent saturable absorption prepared by vaporized synthesis and chemical exfoliation is performed to passively mode-lock the Erbium-doped fiber laser (EDFL). The Si1-xGex with varied Ge/Si composition ratio from 3 to 16 exhibits tunable nonlinear modulation depth from 17% to 22%, where the Si1-xGex with the highest Ge content performs the largest nonlinear modulation depth. When operating the EDFL in the self-amplitude modulation region, the Si1-xGex with Ge/Si composition ratios of 3, 9, and 16 self-starts the EDFL pulsation with pulsewidths of 820, 760, and 730 fs. When operating the EDFL in high gain region, the self-phase modulation induced soliton compression dominates the repulsation of passively mode-locked EDFL, which slightly shrinks the EDFL pulsewidth from 346 to 338 fs. All these demonstrations are premier and important to explore the superior nonstoichiometric Si1-xGex saturable absorbers for ultrafast fiber lasers. |
URI: | http://scholars.ntou.edu.tw/handle/123456789/23025 | ISSN: | 1077-260X | DOI: | 10.1109/JSTQE.2017.2699788 |
Appears in Collections: | 光電與材料科技學系 |
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