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  1. National Taiwan Ocean University Research Hub
  2. 電機資訊學院
  3. 光電與材料科技學系
請用此 Handle URI 來引用此文件: http://scholars.ntou.edu.tw/handle/123456789/23025
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dc.contributor.authorChih-I Wuen_US
dc.contributor.authorGong-Ru Linen_US
dc.contributor.authorChi-Cheng Yangen_US
dc.contributor.authorChih-Hsien Chengen_US
dc.contributor.authorTing-Hui Chenen_US
dc.contributor.authorYung-Hsiang Linen_US
dc.contributor.authorYu-Chieh Chien_US
dc.contributor.authorWei-Hsuan Tsengen_US
dc.contributor.authorPo-Han Changen_US
dc.contributor.authorCheng-Ying Chenen_US
dc.contributor.authorKuei-Hsien Chenen_US
dc.contributor.authorLi-Chyong Chenen_US
dc.date.accessioned2022-11-08T07:35:57Z-
dc.date.available2022-11-08T07:35:57Z-
dc.date.issued2017-04-
dc.identifier.issn1077-260X-
dc.identifier.urihttp://scholars.ntou.edu.tw/handle/123456789/23025-
dc.description.abstractA nonstoichiometric Si1-xGex with composition ratio dependent saturable absorption prepared by vaporized synthesis and chemical exfoliation is performed to passively mode-lock the Erbium-doped fiber laser (EDFL). The Si1-xGex with varied Ge/Si composition ratio from 3 to 16 exhibits tunable nonlinear modulation depth from 17% to 22%, where the Si1-xGex with the highest Ge content performs the largest nonlinear modulation depth. When operating the EDFL in the self-amplitude modulation region, the Si1-xGex with Ge/Si composition ratios of 3, 9, and 16 self-starts the EDFL pulsation with pulsewidths of 820, 760, and 730 fs. When operating the EDFL in high gain region, the self-phase modulation induced soliton compression dominates the repulsation of passively mode-locked EDFL, which slightly shrinks the EDFL pulsewidth from 346 to 338 fs. All these demonstrations are premier and important to explore the superior nonstoichiometric Si1-xGex saturable absorbers for ultrafast fiber lasers.en_US
dc.language.isoen_USen_US
dc.publisherEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INCen_US
dc.relation.ispartofIEEE Journal of Selected Topics in Quantum Electronicsen_US
dc.subjectNANOTUBE SATURABLE ABSORBERen_US
dc.subjectOPTICAL LOOP MIRRORen_US
dc.subjectGRAPHENE OXIDEen_US
dc.subjectGERMANIUMen_US
dc.subjectLOCKINGen_US
dc.subjectSILICONen_US
dc.subjectALLOYSen_US
dc.subjectMODULATIONen_US
dc.subjectSYSTEMSen_US
dc.subjectSOLITONen_US
dc.titleA Ge-rich SiGe Mode-Locker for Erbium-doped Fiber Lasersen_US
dc.typejournal articleen_US
dc.identifier.doi10.1109/JSTQE.2017.2699788-
dc.identifier.isi000409542900001-
dc.relation.journalvolume24en_US
dc.relation.journalissue3en_US
item.fulltextno fulltext-
item.openairecristypehttp://purl.org/coar/resource_type/c_6501-
item.cerifentitytypePublications-
item.grantfulltextnone-
item.languageiso639-1en_US-
item.openairetypejournal article-
crisitem.author.deptNational Taiwan Ocean University,NTOU-
crisitem.author.deptCollege of Engineering-
crisitem.author.deptDepartment of Optoelectronics and Materials Technology-
crisitem.author.parentorgNational Taiwan Ocean University,NTOU-
crisitem.author.parentorgCollege of Electrical Engineering and Computer Science-
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