http://scholars.ntou.edu.tw/handle/123456789/23639
Title: | Mechanical Properties and Oxidation Behavior of TaWSiN Films |
Authors: | Tzeng, Chin-Han Chang, Li-Chun Chen, Yung-, I |
Keywords: | co-sputtering;hard coatings;mechanical properties;oxidation;residual stress |
Issue Date: | 1-Nov-2022 |
Publisher: | MDPI |
Journal Volume: | 15 |
Journal Issue: | 22 |
Source: | MATERIALS |
Abstract: | This study explored the structural characteristics, mechanical properties, and oxidation behavior of W-enriched TaWSiN films prepared through co-sputtering. The atomic ratios [W/(W + Ta)] of the as-deposited films maintained a range of 0.77-0.81. The TaWSiN films with a Si content of 0-13 at.% were crystalline, whereas the film with 20 at.% Si was amorphous. The hardness and Young's modulus of cry... |
URI: | http://scholars.ntou.edu.tw/handle/123456789/23639 |
DOI: | 10.3390/ma15228179 |
Appears in Collections: | 光電與材料科技學系 |
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