http://scholars.ntou.edu.tw/handle/123456789/24533
標題: | Structural, mechanical, and anticorrosive properties of (TiZrNbTa)N<i><sub>x</sub></i> films | 作者: | Lai, Cheng -Yi Chen, Yung-, I |
關鍵字: | Anticorrosive properties;Co-sputtering;Mechanical properties;Medium-entropy alloys;Transition metal nitride films | 公開日期: | 九月-2023 | 出版社: | ELSEVIER | 卷: | 26 | 起(迄)頁: | 8327-8336 | 來源出版物: | JOURNAL OF MATERIALS RESEARCH AND TECHNOLOGY-JMR&T | 摘要: | (TiZrNbTa)N-x films were fabricated at various nitrogen flow ratios (R-N2) through reactive direct current magnetron co-sputtering. The structural, mechanical, and anticorrosive properties of the (TiZrNbTa)N-x films were explored. The metallic TiZrNbTa film formed a body-centered cubic phase, and the film (N05) deposited at R-N2 = 5% exhibited a nanocrystalline structure consisting of close-packed hexagonal and face-centered cubic (FCC) phases. In contrast, the films prepared at R-N2 > 10% demonstrated an FCC phase. The N05 film has hardness and elastic modulus of 23.5 and 220 GPa, respectively, the highest hardness and relatively lower elastic modules among the studied nitride films. Moreover, the N05 film has the highest polarization resistance of 198 k Omega center dot cm(2) measured by the potentiodynamic polarization method. The chemical states of the (TiZrNbTa)N-x films were examined by X-ray photoelectron spectroscopy. (c) 2023 The Author(s). Published by Elsevier B.V. This is an open access article under the CC BY license (http://creativecommons.org/licenses/by/4.0/). |
URI: | http://scholars.ntou.edu.tw/handle/123456789/24533 | ISSN: | 2238-7854 | DOI: | 10.1016/j.jmrt.2023.09.173 |
顯示於: | 光電與材料科技學系 |
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