THERMOMECHANICAL RESPONSE ANALYSIS OF LITHOGRAPHIC MASK STRUCTURE USING FINITE-ELEMENT METHOD

Please use this identifier to cite or link to this item: http://scholars.ntou.edu.tw/handle/123456789/2516

Title:	THERMOMECHANICAL RESPONSE ANALYSIS OF LITHOGRAPHIC MASK STRUCTURE USING FINITE-ELEMENT METHOD
Authors:	Li, D. C. Chyuan, S. W. Jeng-Tzong Chen Sun, C. Y.
Issue Date:	Oct-1995
Journal Volume:	38
Journal Issue:	4
Source:	Jsme International Journal Series a-Mechanics and Material Engineering
URI:	http://scholars.ntou.edu.tw/handle/123456789/2516
ISSN:	1340-8046
DOI:	10.1299/jsmea1993.38.4_563 ://WOS:A1995TF11700022
Appears in Collections:	河海工程學系

Show full item record

Last Week
0

Last month
0

checked on Oct 13, 2022

Check

DSpace CRIS