http://scholars.ntou.edu.tw/handle/123456789/4429
標題: | Oxidation behavior of Ru–Al multilayer coatings | 作者: | Zhi-Ting Zheng Wu Kai Yu-Ren Huang Yung-I Chen |
關鍵字: | Auger electron spectroscopy;Kinetics;Multilayer coatings;Nanostructure;Oxidation;X-ray photoelectron spectroscopy | 公開日期: | 六月-2017 | 出版社: | Elsevier | 卷: | 406 | 起(迄)頁: | 1-7 | 來源出版物: | Applied Surface Science | 摘要: | Ru0.63Al0.37 coatings were deposited through a cyclical gradient concentration deposition at 400 °C with a substrate-holder rotation speed of 1 rpm by direct current magnetron cosputtering. Scanning electron microscopy revealed that the as-deposited coatings exhibited a multilayer structure along with the columnar structure. The oxidation behavior of the Ru0.63Al0.37 coatings was examined through X-ray diffraction, Auger electron spectroscopy, transmission electron microscopy, and X-ray photoelectron spectroscopy. Oxidation kinetics was measured using a thermogravimetric analyzer. Internal oxidation was observed for Ru0.63Al0.37 coatings annealed in a 1% O2–99% Ar atmosphere at 400–600 °C accompanied with activation energies of 72–84 kJ/mol. By contrast, external oxidation was observed after annealing at 700–800 °C, resulting in the formation of a continuous alumina scale consisting of crystalline δ-Al2O3 domains, which can be attributable to the outward diffusion of Al. |
URI: | http://scholars.ntou.edu.tw/handle/123456789/4429 | ISSN: | 0169-4332 | DOI: | 10.1016/j.apsusc.2017.02.096 |
顯示於: | 光電與材料科技學系 |
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