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  1. National Taiwan Ocean University Research Hub

Enhancing High-Temperature Oxidation-Resistant Ability of Both Nicocr- and Nifecr-Based Medium and High-Entropy Alloys(1/3)

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Project title
Enhancing High-Temperature Oxidation-Resistant Ability of Both Nicocr- and Nifecr-Based Medium and High-Entropy Alloys(1/3)
Code/計畫編號
MOST109-2221-E019-044
Translated Name/計畫中文名
循環漸變成分多元合金及其氮化物濺鍍膜層的機械性質與高溫穩定性(1/3)
 
Project Coordinator/計畫主持人
Wu Kai
Funding Organization/主管機關
National Science and Technology Council
 
Department/Unit
Department of Optoelectronics and Materials Technology
Website
https://www.grb.gov.tw/search/planDetail?id=13532218
Year
2020
 
Start date/計畫起
01-08-2020
Expected Completion/計畫迄
31-07-2021
 
Bugetid/研究經費
1594千元
 
ResearchField/研究領域
材料科技
 

Description

Abstract
This project investigates the mechanical properties and thermal stability of sputtered multi-component alloy and nitride thin films with cyclical gradient concentration, which is based on our previous studies on the coatings with cyclical gradient concentration and the new idea of high-entropy alloy thin films. This project is a three-year program. In the first year, NbMoTaW thin films are prepared through cosputtering under the mode of cyclical gradient concentration. The main process parameters include sputtering powers, substrate temperature, and substrate-holder rotation speed. The evaluated characteristics include crystalline structure, mechanical properties, and high-temperature thermal stability. In the second year, (NbMoTaW)N thin films are fabricated. The structural evolution affects the mechanocal properties, thermal stability, and interdiffusion of atoms, which is depended on either the N atoms occupy the interstitial sites in the metallic matrix or react with the metal atoms to form nitride compounds. In the third year, the characteristics of (NbMoTaW)SiN thinfilms are invesitaged. The hardness enhancement of M–Si–N coatings is attributed to solid solution strengthening, nanocomposite formation hardening, and the residual stress effect. The roles of N and Si atoms on the variations of structure and characteristics are interesting topics. The film thickness is controlled at approximately 1000 nm for analyzing the results examined by nanoindentation test, Auger electron spectroscopy, transmission electron microscopy, and X-ray photoelectron spectroscopy. The thermal stability is evaluated in air above 300 °C or in inert atmospheres at high temperatures. 依據此前於循環漸變成分堆疊薄膜的研究心得,加入高熵合金的新興概念,期望發展出多功能新材質鍍膜,探索「循環漸變成分多元合金及其氮化物濺鍍膜層的機械性質與高溫穩定性」。本計畫分三個年度進行。第一年度以共濺鍍以及循環漸變成分模式,調配各靶材的濺鍍功率、基板溫度以及基板座旋轉速度,製備不同成分分布NbMoTaW薄膜,評估其結構與機械性質及高溫穩定性。第二年度探討(NbMoTaW)N薄膜在N加入以金屬為基底的膜層中,係單純佔據間隙位置或與金屬元素形成特定氮化物,此將會影響到結構變化,乃至機械性質、熱穩定性、元素擴散等值得探討的問題。第三年度探討(NbMoTaW)SiN薄膜的特性。含矽氮化物的硬度強化機制可分為固溶強化、奈米複合硬化以及殘留應力效應。因此,調控N與Si的含量如何影響其結構乃至各種特性是有趣的議題。膜層厚度控制約1000 nm,以配合奈米壓痕硬度測試、歐傑電子光譜、穿透式電子顯微鏡、X光電子光譜等分析。高溫穩定性參考文獻資料,執行300 °C以上大氣熱處理,或鈍態氣氛高溫熱處理。
 
Keyword(s)
擴散阻障層
硬質鍍層
高熵合金
機械性質
多層膜結構
奈米複合膜
氮化物膜
抗氧化性
濺鍍
熱穩定性
Diffusion barriers
Hard coatings
High-entropy alloys
Mechanical properties
Multilayered structure
Nanocomposite films
Nitride films
Oxidation resistance
Sputtering
Thermal stability
 
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