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Please use this identifier to cite or link to this item: http://scholars.ntou.edu.tw/handle/123456789/2088
Title: Influence of Rapid Thermal Annealing on Raman Scattering of InN Epilayers
Authors: Yang, M. D.
Tong, S. C.
Chou, I. T.
Shu, G. W.
Shen, J. L.
Lee, Y. C.
Huang, Y. S.
Chen, Y. F.
Tai-Yuan Lin 
Issue Date: 2010
Journal Volume: 49
Journal Issue: 10
Source: Japanese Journal of Applied Physics
URI: http://scholars.ntou.edu.tw/handle/123456789/2088
ISSN: 0021-4922
DOI: 10.1143/jjap.49.105803
://WOS:000283142900056
Appears in Collections:光電與材料科技學系

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