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  2. 電機資訊學院
  3. 光電與材料科技學系
Please use this identifier to cite or link to this item: http://scholars.ntou.edu.tw/handle/123456789/23025
Title: A Ge-rich SiGe Mode-Locker for Erbium-doped Fiber Lasers
Authors: Chih-I Wu
Gong-Ru Lin
Chi-Cheng Yang
Chih-Hsien Cheng
Ting-Hui Chen
Yung-Hsiang Lin
Yu-Chieh Chi
Wei-Hsuan Tseng
Po-Han Chang
Cheng-Ying Chen 
Kuei-Hsien Chen
Li-Chyong Chen
Keywords: NANOTUBE SATURABLE ABSORBER;OPTICAL LOOP MIRROR;GRAPHENE OXIDE;GERMANIUM;LOCKING;SILICON;ALLOYS;MODULATION;SYSTEMS;SOLITON
Issue Date: Apr-2017
Publisher: EEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
Journal Volume: 24
Journal Issue: 3
Source: IEEE Journal of Selected Topics in Quantum Electronics
Abstract: 
A nonstoichiometric Si1-xGex with composition ratio dependent saturable absorption prepared by vaporized synthesis and chemical exfoliation is performed to passively mode-lock the Erbium-doped fiber laser (EDFL). The Si1-xGex with varied Ge/Si composition ratio from 3 to 16 exhibits tunable nonlinear modulation depth from 17% to 22%, where the Si1-xGex with the highest Ge content performs the largest nonlinear modulation depth. When operating the EDFL in the self-amplitude modulation region, the Si1-xGex with Ge/Si composition ratios of 3, 9, and 16 self-starts the EDFL pulsation with pulsewidths of 820, 760, and 730 fs. When operating the EDFL in high gain region, the self-phase modulation induced soliton compression dominates the repulsation of passively mode-locked EDFL, which slightly shrinks the EDFL pulsewidth from 346 to 338 fs. All these demonstrations are premier and important to explore the superior nonstoichiometric Si1-xGex saturable absorbers for ultrafast fiber lasers.
URI: http://scholars.ntou.edu.tw/handle/123456789/23025
ISSN: 1077-260X
DOI: 10.1109/JSTQE.2017.2699788
Appears in Collections:光電與材料科技學系

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