Effect of MoN on the structure and characteristics of MoN/ZrMoN bi-layer nitride films

Abstract

Multi-alloy-modified film is used to protect the surface of tools and components. MoN/ZrMoN bi-layer films are deposited by sputtering. The effect of the MoN deposition time and the DC power for the Zr target on the structure and mechanical performance of the coated films is studied. The ZrMoN films correspond to the (111), (200) and (220) crystal planes of the FCC (NaCl) structures. The diffraction peaks for the (111) plane gradually shift to lower 2 theta values as the Zr content is increased. For a MoN buffer layer with a thickness of similar to 393 nm, the ZrMoN film has a hardness of 12.53 GPa and a coefficient of friction of 0.42. As the DC power for the Zr target is increased to 200 W, the e hardness and elastic recovery for the MoN/ZrMoN bi-layer films are 15.65 GPa and 67.70%, respectively, which are the maximum respective values. The experimental results show that these bi-layer films have good mechanical performance and adhesive strength.