Effects of silicon content on the characterization of (CrTaWSi)N_x thin films

Abstract

(CrTaWSi)N-x films with 0-15.8 at.%Si were fabricated through magnetron cosputtering. The influences of Si content on the structural, mechanical, tribological, and antioxidative properties of (CrTaWSi)N-x films were evaluated. The films grew a face-centered cubic phase and amorphous structure as the Si content was <6.4 at.% and >12.5 at.%, respectively. The crystalline (CrTaWSi)N-x film with 6.4 at.%Si had the highest hardness and elastic modulus of 30.5 and 304 GPa, respectively. In contrast, the mechanical properties of the amorphous (CrTaWSi)N-x films were at low levels. Moreover, the films with higher hardness were ascribed to the nano-composite formation, accompanied by higher wear resistance and lower coefficient of friction. The (Cr0.31Ta0.10W0.31Si0.28)N-0.76 films with 15.8 at.%Si maintained an amorphous structure after annealing at 600 degrees C up to 24 h in the air accompanied by a surficial oxide layer restricting further oxidation.