http://scholars.ntou.edu.tw/handle/123456789/16030| Title: | Phase-change masking for nanolithography | Authors: | C. H. Chu C. D. Shiue H. W. Chen B. H. Chen D. Chiang H. -P. Chiang D. P. Tsai |
Issue Date: | 4-Oct-2009 | Publisher: | International Symposium on Optical Memory 2009 | Conference: | International Symposium on Optical Memory 2009 | Description: | 舉辦地點: Nagasaki Brick Hall, Nagasaki, Japan |
URI: | http://scholars.ntou.edu.tw/handle/123456789/16030 |
| Appears in Collections: | 光電與材料科技學系 |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.
