http://scholars.ntou.edu.tw/handle/123456789/5516| Title: | Bias-temperature instability on fully silicided-germanided gates/high-k Al2O3CMOSFETs | Authors: | Liao, C. C. Yu, D. S. Cheng-Fa Cheng Chin, A. |
Issue Date: | 2005 | Journal Volume: | 152 | Journal Issue: | 6 | Source: | Journal of the Electrochemical Society | URI: | http://scholars.ntou.edu.tw/handle/123456789/5516 | ISSN: | 0013-4651 | DOI: | 10.1149/1.1901104 |
| Appears in Collections: | 通訊與導航工程學系 |
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