http://scholars.ntou.edu.tw/handle/123456789/1989| Title: | Refractive index behavior of boron-doped silica films by plasma-enhanced chemical vapor deposition | Authors: | Horng, R. H. Chen, F. Wuu, D. S. Tai-Yuan Lin |
Issue Date: | Feb-1996 | Journal Volume: | 92 | Source: | Applied Surface Science | URI: | http://scholars.ntou.edu.tw/handle/123456789/1989 | ISSN: | 0169-4332 | DOI: | 10.1016/0169-4332(95)00261-8 |
| Appears in Collections: | 光電與材料科技學系 |
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