http://scholars.ntou.edu.tw/handle/123456789/5515| Title: | The copper contamination effect of Al2O3 gate dielectric on Si | Authors: | Liao, C. C. Cheng-Fa Cheng Yu, D. S. Chin, A. |
Issue Date: | 2004 | Journal Volume: | 151 | Journal Issue: | 10 | Source: | Journal of the Electrochemical Society | URI: | http://scholars.ntou.edu.tw/handle/123456789/5515 | ISSN: | 0013-4651 | DOI: | 10.1149/1.1789391 |
| Appears in Collections: | 通訊與導航工程學系 |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.