Improvement on Reliability Properties of Metal-Ferroelectric (BiFeO3)-Insulator (HfO2)-Semiconductor Structures Fabricated by Oxygen-Incorporated Magnetron Sputtering

Please use this identifier to cite or link to this item: http://scholars.ntou.edu.tw/handle/123456789/6151

Title:	Improvement on Reliability Properties of Metal-Ferroelectric (BiFeO3)-Insulator (HfO2)-Semiconductor Structures Fabricated by Oxygen-Incorporated Magnetron Sputtering
Authors:	Juan, T. P. C. Lu, J. H. Ming-Wei Lu
Issue Date:	2008
Journal Volume:	155
Journal Issue:	12
Source:	Journal of the Electrochemical Society
URI:	http://scholars.ntou.edu.tw/handle/123456789/6151
ISSN:	0013-4651
DOI:	10.1149/1.2994630 ://WOS:000260479700078
Appears in Collections:	水產養殖學系

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