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Please use this identifier to cite or link to this item: http://scholars.ntou.edu.tw/handle/123456789/6152
Title: Influence of Ar/O-2 ratio on the electrical properties of metal-ferroelectric (BiFeO3)-insulator (HfO2)-semiconductor capacitors fabricated by rf magnetron sputtering
Authors: Juan, T. P. C.
Lu, J. H.
Ming-Wei Lu 
Issue Date: Jan-2009
Journal Volume: 27
Journal Issue: 1
Source: Journal of Vacuum Science & Technology B
URI: http://scholars.ntou.edu.tw/handle/123456789/6152
ISSN: 2166-2746
DOI: 10.1116/1.3021025
://WOS:000265839000061
Appears in Collections:水產養殖學系

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