Measurements of dielectric properties of TiO2 thin films at microwave frequencies using an extended cavity perturbation technique

Please use this identifier to cite or link to this item: http://scholars.ntou.edu.tw/handle/123456789/3153

Title:	Measurements of dielectric properties of TiO2 thin films at microwave frequencies using an extended cavity perturbation technique
Authors:	Jyh-Jong Sheen Li, C. Y. Ji, L. W. Mao, W. L. Liu, W. H. Chen, C. A.
Issue Date:	Aug-2010
Journal Volume:	21
Journal Issue:	8
Source:	Journal of Materials Science-Materials in Electronics
URI:	http://scholars.ntou.edu.tw/handle/123456789/3153
ISSN:	0957-4522
DOI:	10.1007/s10854-009-9999-8 ://WOS:000279034200010
Appears in Collections:	機械與機電工程學系

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