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Please use this identifier to cite or link to this item: http://scholars.ntou.edu.tw/handle/123456789/3158
Title: Effects of Non-Stoichiometry on the Microstructure, Oxygen Vacancies, and Electrical Properties of KNN-Based Thin Films
Authors: Weng, C. M.
Tsai, C. C.
Hong, C. S.
Lin, C. C.
Chen, C. C.
Chu, S. Y.
Jyh-Jong Sheen 
Chen, Z. Y.
Su, H. H.
Issue Date: 2016
Journal Volume: 5
Journal Issue: 9
Source: Ecs Journal of Solid State Science and Technology
URI: http://scholars.ntou.edu.tw/handle/123456789/3158
ISSN: 2162-8769
DOI: 10.1149/2.0291609jss
://WOS:000387983000005
Appears in Collections:機械與機電工程學系

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